EXPEC 4850

Dual-chamber spark-OES designed for accurate UV element detection and full matrix coverage.

• Status: Active
• Country: China
• Type of measurable elements: Metals and non-metals
• Measurable isotopes/elements: Fe, Al, Cu, Zn, Ni, Ti, Mg, Co, including elements like nitrogen and UV-sensitive species
• Possible Matrixes : Full matrix coverage including Fe, Al, Cu, Zn, Ni, Ti, Mg, Co
• Optic System : Paschen-Runge dual chamber system
• Optical chamber : Dual argon-purged chamber with optimized UV path
• Detection system/detector : Multiple high-performance CMOS detectors
• Grating /Wavelength range : 140–680 nm
• Spark Stand : Open platform, modular sample adapters, 13 mm aperture (optional 6 mm), easy maintenance
• Source frequency : Max 1000 Hz
• Discharge parameters : Spark pulse: 20–230 V; Arc: 20–60 V; Pre-ignition: 1–14 kV; Current: up to 400 A
• Spark Stand : High-energy pre-ignition: 1–14 kV
• Correction : Intelligent maintenance reminders and customizable calibration
• Gas supply: Argon 99.999%, 0.5 MPa; burn: 3.5 L/min; standby: 0.2 L/min
• Power Requirements and Consumption : 221 ± 20 V AC, 50 ± 1 Hz; Max 400 W during excitation; 50 W standby
• Environmental requirements : Working temp: 10–30 °C; Storage: 0–45 °C; Humidity: 20–80% RH
• Dimensions and Weight: 623 × 735 × 443 mm; ~70 kg