Specifications

  • Category: Optical Emission Spectroscopy
  • Technique: Spark-OES/GD-OES
  • Manufacturer: Hitachi High-Tech
  • Country: Japan
  • Available: Active
All specifications

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Short description

High-performance spark-OES for full-range metals analysis including trace elements.

Specifications

High-performance spark-OES for full-range metals analysis including trace elements.

  • Status: Active
  • Country: Japan
  • Type of measurable elements: Metals and non-metals
  • Measurable isotopes/elements: All main alloying, tramp, and trace elements in metals
  • Sensitivity : Low detection limits in the ppm range
  • Possible Matrixes : Steel, iron, aluminum, copper, nickel, zinc, magnesium, titanium, cobalt, and more
  • Optic System : Rowland circle Paschen-Runge
  • Optical chamber : Compact optics housing with direct coupling to spark stand, argon purged
  • Detection system/detector : Multi-CMOS semiconductor detectors, optimized for high resolution
  • Grating /Wavelength range : 174–670 nm (extendable to 766 nm on request)
  • Spark Stand : Integrated spark stand, optimized for stable plasma and low gas usage
  • Source frequency : 80–1000 Hz
  • Discharge parameters : Voltage: 250–500 V; High Energy Pre-Spark (HEPS) enabled
  • Correction : charge correction (optional), SPC (optional)
  • Compact: Yes
  • Gas supply: Argon
  • Power Requirements and Consumption : 100–240 V AC, 50/60 Hz; Max. 430 W, standby 45 W (source on 50 W)
  • Dimensions and Weight: Benchtop: 425 × 535 × 760 mm, 84 kg; Floor-stand: 425 × 535 × 1250 mm, 162 kg

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  • Category: Electron Microscopy
  • Technique: Scanning Electron Microscopy
  • Manufacturer: Hitachi High-Tech
  • Country: Japan
  • Available: Active
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