OES8000

High-resolution spark-OES with extended wavelength range for complex ferrous and non-ferrous analysis

• Status: Active
• Country: China
• Type of measurable elements: Metals and non-metals
• Measurable isotopes/elements: Dozens of elements across multiple metal matrices
• Sensitivity : Same, with 10 pm/pixel resolution for high detail
• Possible Matrixes : Steel, nickel alloy, aluminum, copper, zinc, magnesium, etc.
• Optic System : Paschen-Runge, 350 mm focal length, high-res 10 pm/pixel optics
• Optical chamber : Non-vacuum design using special casting to reduce deformation
• Detection system/detector : Toshiba high-performance linear CCD array
• Grating /Wavelength range : 140–800 nm; 3600 l/mm grating, 1.2 nm/mm dispersion
• Spark Stand : 5 mm analytical gap with jet stream technology; no argon use in standby
• Source frequency : 100–1000 Hz
• Discharge parameters : Digital plasma generator, High Energy Pre-Spark (HEPS), 1–80 A current
• Correction : Simplified calibration using standard samples
• Compact: Yes
• Gas supply: Argon 99.999%, no consumption during standby
• Power Requirements and Consumption : 220 V ±5%, 50 Hz; max 1.5 kVA operation, 70 VA standby
• Environmental requirements : 15–30 °C; <70% humidity
• Dimensions and Weight: 80 x 75 x 45 cm; 30 kg