PHI nanoTOF 3

Advanced Time-of-Flight Secondary Ion Mass Spectrometer optimized for surface analysis and depth profiling. Features include high mass resolution, nanoscale spatial resolution, and parallel imaging MS/MS for molecular structure analysis. Designed for a wide range of materials, including insulating and reactive samples.

• Status: Active
• Country: Japan
• Isotopic: Yes
• Elemental: Yes
• Type of measurable elements: Most of elements, isotopes, and molecular species
• Measurable isotopes/elements: Isotopes and molecular fragments, including light and heavy elements
• Analyzer type : Time-of-Flight MS
• Ion source type: Bi3+ Liquid Metal Ion Gun (LMIG), Ar Gas Cluster Ion Beam (GCIB), Cs+ and O2+ ion guns
• Inlet types: Automated sample handling with glove box compatibility
• High Resolution : Yes
• Mass resolution/ Mass resolving power : ≥ 15,000 m/∆m at m/z=28m/z on silicon wafer
• Detection limits : Sub-ppm for molecular and elemental species
• Detector type : Microchannel plate detector with phosphor screen and time-to-digital converter
• Primary beam : Bi3+, Ar+, Cs+, and O2+
• Voltage : Primary beam voltage up to 30 kV
• Spatial resolution : 50 nm (minimum pulsed beam diameter in high spatial resolution mode)
• Depth profile : ≤ 1 nm depth resolution with low-damage ion beam etching
• Beam energy : Adjustable up to 30 keV
• Camera : High-resolution camera for sample imaging and navigation
• Geometry type : Triple-focusing TOF analyzer geometry
• Focusing type : Electrostatic focusing for high-resolution ion beams
• Cooling system : Water cooling system for efficient operation
• Vacuum system : Ultra-high vacuum system with turbo-molecular pumps
• Gas supply: Argon, cesium, and oxygen for ion sources and etching processes
• Power Requirements and Consumption : 200-230 V AC, 50 A, single-phase, 50/60 Hz
• Environmental requirements : Temperature: 24 ± 3°C; Humidity: ≤ 70%; Static magnetic fields < 100 µT
• Dimensions and Weight: Minimum floor space: ~4.0 × 3.5 m; Height: 2.5 m (with MS/MS option)