Specifications

  • Category: Peripherals for Inorganic and Isotopic MS
  • Technique: Laser Systems
  • Manufacturer: Elemental Scientific Lasers
  • Country: USA
  • Available: Active
All specifications

About

Short description

High energy excimer-based laser ablation system operating at 193 nm. Designed for both opaque and highly transmissive materials. Provides high spatial reproducibility with spot sizes from 2 to 300 µm.

Specifications

High energy excimer-based laser ablation system operating at 193 nm. Designed for both opaque and highly transmissive materials. Provides high spatial reproducibility with spot sizes from 2 to 300 µm.

  • Status: Active
  • Country: USA
  • Device Class (Function) : Laser ablation system
  • Technique Compatibility : ICP-MS
  • Brand Independence : Yes
  • Laser type : Excimer 193 nm
  • Performance Metrics : Energy density >50 J/cm²; Spot sizes 2–300 µm; IVA and dual magnification; TwoVol2 ablation cell
  • Power Requirements and Consumption : -
  • Environmental requirements : -
  • Dimensions and Weight: -

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  • Category: Peripherals for Inorganic and Isotopic MS
  • Technique: Laser Systems
  • Manufacturer: Elemental Scientific Lasers
  • Country: USA
  • Available: Active
Detailed