icpTOF R

High-resolution TOF ICP-MS with 33000 extractions/s.

• Status: Active
• Country: Switzerland
• Elemental: Yes
• Type of measurable elements: Metals and non-metals
• Analyzer type : Time-of-Flight MS
• Ion source type: Inductively Coupled Plasma
• Mass range : 6–280 amu
• Mass resolution/ Mass resolving power : RP >3000 for 238U
• Sensitivity : 59Co: 10000 cps/ppb, 115In: 20000 cps/ppb, 238U: 50000 cps/ppb
• Dynamic range : >10⁶
• Detection limits : Low ppt
• Precision : <1% RSD short-term, <2% RSD long-term
• Signal stability, relative standard deviation : <2% over 10 minutes
• Detector type : MCP detector
• Oxides (%) : 140Ce16O/140Ce <2.5%
• Reaction cell system : Yes
• Reaction cell system details: Flatapole with He and optional gases
• Spray chamber : Peltier-cooled cyclone quartz chamber
• Nebulizer : Concentric glass, 400 µL/min flow rate
• Peristaltic pump : 12-roller, 4-channel, low pulsation
• Torch : Single-piece quartz push-in
• Injector : Self-aligning, screw-in, 2.5 mm ID
• Interface : Ni sample and skimmer cones, Pt optional
• RF generator power : 400-1600 W (default 1550 W)
• Dwell time : 30 ms minimum
• Focusing type : RAPID 90° ion lens
• Cooling system : Peltier-cooled
• Vacuum system : Three-stage differential pumping
• Gas supply: Argon