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icpTOF S2
Main
Inst. Database
ICP-TOF-MS
Specifications
Category:
Inductively Coupled Plasma Mass Spectrometry
Technique:
ICP-TOF-MS
Manufacturer:
TOFWERK
Country:
Switzerland
Available:
Active
All specifications
Download “Conclusions.PDF”
Download “Conclusions.PDF”
About
Specifications
About
Short description
High-resolution TOF ICP MS with 83000 extractions/s.
All about
Specifications
High-resolution TOF ICP MS with 83000 extractions/s.
Status:
Active
Country:
Switzerland
Elemental:
Yes
Type of measurable elements:
Metals and non-metals
Analyzer type
:
Time-of-Flight MS
Ion source type:
Inductively Coupled Plasma
Mass range
:
6–280 amu
Mass resolution/ Mass resolving power
:
RP >900 for 238U
Sensitivity
:
59Co: 25000 cps/ppb, 115In: 80000 cps/ppb, 238U: 300000 cps/ppb
Dynamic range
:
>10⁶
Detection limits
:
Low ppt
Precision
:
<1% RSD short-term, <2% RSD long-term
Signal stability, relative standard deviation
:
<2% over 10 minutes
Detector type
:
MCP detector
Oxides (%)
:
140Ce16O/140Ce <8%
Reaction cell system
:
Yes
Reaction cell system details:
Flatapole with He and optional gases
Spray chamber
:
Peltier-cooled cyclone quartz chamber
Nebulizer
:
Concentric glass, 400 µL/min flow rate
Peristaltic pump
:
12-roller, 4-channel, low pulsation
Torch
:
Single-piece quartz push-in
Injector
:
Self-aligning, screw-in, 2.5 mm ID
Interface
:
Ni sample and skimmer cones, Pt optional
RF generator power
:
400-1600 W (default 1550 W)
CRC gas flow
:
He, O2, NH3/He, H2/He
Dwell time
:
12 ms minimum
Focusing type
:
RAPID 90° ion lens
Cooling system
:
Peltier-cooled
Vacuum system
:
Three-stage differential pumping
Gas supply:
Argon
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