ICP-MS 2000

Cost-effective ICP-MS system.

• Status: Active
• Country: China
• Elemental: Yes
• Type of measurable elements: Metals and non-metals
• Analyzer type : Quadrupole MS (single)
• Ion source type: Inductively Coupled Plasma
• Mass range : 2–255 amu
• Mass resolution/ Mass resolving power : 0.6–0.8 amu
• Sensitivity : Be > 5 × 10⁹ cps/mg/L, In > 60 × 10⁶ cps/mg/L, U > 60 × 10⁶ cps/mg/L
• Dynamic range : >10⁸
• Detection limits : Be < 5 ng/L, In < 0.5 ng/L, U < 0.5 ng/L
• Precision : Variance: <0.05 amu/24 h
• Signal stability, relative standard deviation : Short term: <2%; Long term: <3%
• Reaction cell system : Yes
• Reaction cell system details: Hexapole collision cell for polyatomic ion interference removal
• Spray chamber : Modular sample introduction system with externally mounted atomizer and optional autosampler
• Interface : Plasma shielding technology to improve sensitivity and reduce detection limits
• Vacuum system : Wireless vacuum chamber with simple maintenance under vacuum
• Gas supply: Argon for plasma and helium for collision cell
• Environmental requirements : Laboratory conditions