PlasmaQuant MS Elite S

ICP-MS for demanding applications.

• Status: Active
• Country: Germany
• Elemental: Yes
• Type of measurable elements: Metals and non-metals
• Analyzer type : Quadrupole MS (single)
• Ion source type: Inductively Coupled Plasma
• Mass range : 3–260 amu
• Mass resolution/ Mass resolving power : 0.5–1.2 amu
• Sensitivity : 1500 kcps/ppb for 115In
• Dynamic range : 11 orders of magnitude
• Precision : <3% RSD (20 min), <4% RSD (240 min)
• Signal stability, relative standard deviation : <2% over 10 min
• Detector type : Discrete dynode electron multiplier (DDEM)
• Oxides (%) : <2% CeO+/Ce+, <3% Ba++/Ba+
• Reaction cell system : Yes
• Reaction cell system details: Integrated Collision Reaction Cell technology (iCRC)
• Spray chamber : Peltier-cooled, double-pass Scott-type
• Nebulizer : Glass concentric nebulizer
• Peristaltic pump : 4-channel, adjustable speed
• Torch : One-piece, low-flow torch
• Injector : 2.4 mm ID (optional 1.5 mm and 0.8 mm)
• Interface : Nickel cones with Pt option
• RF generator frequency : 27 MHz
• RF generator power : 300–1600 W
• Dwell time : Minimum 50 µs
• Geometry type : 90-degree ion optics
• Focusing type : Ion mirror for 3D focusing
• Cooling system : Water-cooled
• Vacuum system : Two Pfeiffer HiPace 300 pumps
• Gas supply: Argon (min. 99.996%)
• Power Requirements and Consumption : 200–240 V ±5%, 50/60 Hz
• Environmental requirements : Temp: +10°C to +30°C; Humidity: 20-80%
• Dimensions and Weight: 660 mm x 589 mm x 1131 mm, 186 kg