HF5000

200 kV aberration-corrected TEM/STEM. Sub-angstrom imaging with 0.078 nm STEM resolution. Integrated dual SDD EDX and in-house Cs corrector

• Status: Active
• Country: Japan
• Electron gun type : Cold FEG
• Optional detectors : EDX, Screen camera, Gatan controller, STEM camera
• Cryo : Optional
• STEM : Yes
• STEM parameters: ADF-STEM resolution 0.078 nm
• Additional analytical capabilities (EDS/EDX ; EELS; SAED;NBD; others) : EDX, STEM, TEM, SE imaging
• Electron optics : In-house aberration corrector, symmetrical dual EDX, single objective lens configuration
• Resolution : STEM: 0.078 nm (ADF-STEM), TEM: 0.102 nm (lattice image)
• Electron beam resolution : 0.078–0.102 nm
• Accelerating voltage : 200 kV, 60 kV (optional)
• Image parameters : STEM, TEM, SE imaging, EDX
• Magnification : STEM: ×20 to ×8,000,000; TEM: ×100 to ×1,500,000
• Camera details : Retractable camera, optional screen camera
• Stage parameters : Eucentric 5-axis goniometer stage; X/Y: ±1 mm, Z: ±0.4 mm, α: ±25°, β: ±35°
• Holder Types : Hitachi double-tilt specimen holder
• Sample size: 3 mm diameter
• Aberration Correction type : Probe-forming spherical aberration corrector (Hitachi in-house)
• Cooling system : Cooling water recirculator: 5.1–5.3 L/min and 2.0–2.2 L/min at 16–18 °C
• Vacuum system : Evacuation power supply, dry pump, air compressor
• Power Requirements and Consumption : Main: Single phase AC200–240 V, 50/60 Hz, 10 kVA; Recirculator: 3-phase 200 V, 30 A
• Environmental requirements : 15–23 °C, ±0.2 °C/h; ≤60% RH
• Vibration, Magnetic, Noise tolerance : Must consult Hitachi for site vibration, acoustic noise, magnetic flux
• Dimensions and Weight: Main unit: 1678×1970×3157 mm, 2710 kg; total weight (multiple modules)