SU8700

Ultrahigh-resolution Schottky FE-SEM with variable-pressure mode and automation. Supports high probe current, versatile detection, and 40,960×30,720 imaging.

• Status: Active
• Country: Japan
• Electron gun type : Schottky FEG
• Standard detectors : UD, LD, MD, PD-BSED, UVD
• Optional detectors : EDS, EBSD, STEM, UVD
• Cryo : Optional
• STEM : Yes
• STEM parameters: BF/DF STEM, high-angle and low-kV optimized
• Additional analytical capabilities (EDS/EDX ; EELS; SAED;NBD; others) : EDS, EBSD, STEM, variable-pressure, EM Flow Creator
• Electron optics : Schottky emitter with optimized optics for low-kV, high-resolution imaging
• Resolution : 0.8 nm at15 kV, 0.9 nm at1 kV
• Electron beam resolution : 0.8–0.9 nm
• Beam current : Max. 200 nA
• Accelerating voltage : 0.1–30 kV
• Image parameters : SE, BSE, STEM, CL, multi-signal imaging
• Magnification : 20–2,000,000×
• Chamber : Max. Ø150 mm
• Camera details : 640×480 to 5,120×3,840 and 40,960×30,721
• Stage parameters : 5-axis motor, X/Y/Z: 0–110 mm, Tilt: –5° to 70°, Rot: 360°
• Sample size: Up to Ø150 mm
• Cooling system : Dedicated cooling system
• Vacuum system : Dry pump
• Power Requirements and Consumption : 4 kVA, AC100–240 V
• Environmental requirements : 15–25 °C, ≤60% RH
• Dimensions and Weight: 1,130×1,100×1,800 mm, 670 kg