MAGNA

Ultra-high-resolution SEM with Triglav column and TriLens optics for advanced nanomaterial characterization

• Status: Active
• Country: Czechia
• Electron gun type : Schottky FEG
• Standard detectors : In-Beam SE, Mid-Angle BSE, In-Beam f-BSE
• Optional detectors : In-chamber BSE, TriSE, TriBE, EDS, EBSD, STEM
• STEM : Yes
• STEM parameters: Bright field, dark field, high-angle dark field segmentation
• Additional analytical capabilities (EDS/EDX ; EELS; SAED;NBD; others) : EDS, EBSD, WDS, STEM, TriBE, TriSE, Image Snapper
• Electron optics : Triglav column with TriLens triple-lens compound objective for immersion and analytical modes
• Resolution : 0.6 nm at 15 keV (In-Beam SE), 1.2 nm at 1 keV (In-Beam SE), 0.9 nm at 1 keV (BDM), 0.6 nm at 30 keV (STEM)
• Optical column : Triglav SEM column with TriLens optics and field-free analytical mode
• Electron beam resolution : 0.5–1.2 nm depending on mode and voltage
• Beam current : Up to 400 nA
• Accelerating voltage : 200 eV – 30 keV (with BDM option)
• Image parameters : In-Beam SE/BSE, energy-filtered contrast, In-Flight Beam Tracing, TriSE and TriBE imaging modes
• Chamber : Compatible with multiple port configuration
• Camera details : -; supports STEM image stitching up to 42,000 pixels FOV
• Stage parameters : Motorized stage; STEM detector motorized and segmented
• Holder Types : STEM grid holder, sample prep via FIB for lamella
• Sample size: Thin lamella (STEM), nano-objects
• Aberration Correction type : Reduced aberrations via TriLens and crossover-free configuration
• Vacuum system : Unispecified; compatible with high-vacuum UHR and BDM modes