SEM5000X

Ultra-high-resolution FE-SEM with 0.6 nm resolution, dual deceleration, up to 208 mm wafers

• Status: Active
• Country: China
• Electron gun type : Schottky FEG
• Standard detectors : In-lens detector, ETD
• Optional detectors : BSED (retractable), STEM, EDS, EBSD, 4"/8" loadlock, anti-vibration platform
• STEM : Optional
• STEM parameters: Retractable; high-res 3D ion-STEM
• Additional analytical capabilities (EDS/EDX ; EELS; SAED;NBD; others) : EDS, EBSD, 3D, loadlock plasma clean, AI denoise
• Electron optics : SuperTunnel + dual deceleration, magnetic/electrostatic lens combo
• Resolution : 0.6 nm @ 15 kV (SE), 1.0 nm @ 1 kV (SE)
• Optical column : Dual deceleration column, SuperTunnel optics
• Electron beam resolution : 0.6–1.0 nm depending on mode
• Accelerating voltage : 0.02–30 kV
• Image parameters : Auto focus, stitching, AI noise reduction, 3D recon
• Magnification : 1× – 2,500,000×
• Chamber : 16 ports; 4"/8" loadlock; stage X/Y=110 mm, Z=65 mm
• Camera details : Dual cameras
• Stage parameters : 5-axis mechanical eucentric: X/Y=110 mm, Z=65 mm
• Holder Types : Up to 8” wafer, various holders
• Sample size: Max Ø208 mm (8”)
• Aberration Correction type : SuperTunnel + stage deceleration reduces aberrations
• Cooling system : Water-cooled deceleration, optional enclosure
• Vacuum system : Auto control, cleanroom-compatible
• Environmental requirements : Magnetic field + acoustic enclosure optional
• Vibration, Magnetic, Noise tolerance : Optional enclosure; SEMI certified