Specifications

  • Category: Electron Microscopy
  • Technique: Scanning Electron Microscopy
  • Manufacturer: EOI
  • Country: USA
  • Available: Active
All specifications

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Short description

High-resolution big-chamber SEM with LaB₆ source, long stage movement, and advanced automation

Specifications

High-resolution big-chamber SEM with LaB₆ source, long stage movement, and advanced automation

  • Status: Active
  • Country: USA
  • Electron gun type : W Thermionic source
  • Standard detectors : SE Detector (ET-type)
  • Optional detectors : EDS, EBSD, WDS, CL, Raman, 3D Imaging, E-beam Lithography, Chamber Camera
  • Cryo : Optional
  • STEM : Optional
  • Additional analytical capabilities (EDS/EDX ; EELS; SAED;NBD; others) : EDS, EBSD, WDS, CL, Raman, E-beam Lithography, 3D Imaging
  • Electron optics : Big chamber optics with SE detection and beam shift 100 μm
  • Resolution : 2.0 nm (SE)
  • Electron beam resolution : 2.0 nm
  • Accelerating voltage : 200 V – 30 kV
  • Image parameters : Focus, preview, slow, and photo modes; 3200×2400 max; auto brightness/focus/filament
  • Magnification : ×10 – ×300,000
  • Chamber : 210 mm (D) × 65 mm (H)
  • Camera details : Internal monitoring camera
  • Stage parameters : 5-axis Motorized: X/Y: 120 mm, Z: 5–65 mm, Tilt: –20° ~ +90°, Rotation: 360°
  • Sample size: 210 mm (D) × 65 mm (H)
  • Vacuum system : Turbo pump + rotary vane pump, auto valve system; vacuum ready in 3 minutes
  • Power Requirements and Consumption : 100 – 240 VAC, 50/60 Hz, 1 kVA
  • Dimensions and Weight: 800 × 825 × 1500 mm, 230 kg

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Other company product

Genesis-2120

  • Category: Electron Microscopy
  • Technique: Scanning Electron Microscopy
  • Manufacturer: EOI
  • Country: USA
  • Available: Active
Detailed