Specifications

  • Category: Electron Microscopy
  • Technique: Scanning Electron Microscopy
  • Manufacturer: JEOL
  • Country: Japan
  • Available: Active
All specifications

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Short description

Tungsten SEM with large multipurpose chamber. Equipped with embedded EDS, optional cryo holder, and automation for routine imaging.

Specifications

Tungsten SEM with large multipurpose chamber. Equipped with embedded EDS, optional cryo holder, and automation for routine imaging.

  • Status: Active
  • Country: Japan
  • Electron gun type : Schottky FEG
  • Standard detectors : SED, BED, EDS
  • Optional detectors : LHSED, LVSED, WDS, EBSD
  • Cryo : Optional
  • Additional analytical capabilities (EDS/EDX ; EELS; SAED;NBD; others) : EDS, WDS, EBSD, LHSED, 3D analysis
  • Electron optics : Fully automatic gun alignment
  • Resolution : 3.0 nm (30 kV), 15.0 nm (1.0 kV); 4.0 nm (30 kV BED) in low vacuum
  • Beam current : 1 pA to 1 μA
  • Accelerating voltage : 0.3 to 30 kV
  • Image parameters : 640×480 to 5120×3840 px
  • Magnification : ×5 to ×300,000 (photo); ×14 to ×839,724 (display)
  • Chamber : Multi-purpose chamber with 11 ports
  • Camera details : Optional chamber scope
  • Stage parameters : X: 125 mm, Y: 100 mm, Z: 80 mm, Tilt: -10°–90°, Rotation: 360°
  • Holder Types : Dual EDS, large/tall samples, cryo holder
  • Sample size: Max Ø200 mm, H: 80 mm
  • Cooling system : Optional cryo stage
  • Vacuum system : TMP ×1, RP ×1 or 2
  • Power Requirements and Consumption : 100 V AC, 50/60 Hz, 3.0 kVA
  • Environmental requirements : 20 ±5°C, ≤60% RH, ≤0.3 μT
  • Vibration, Magnetic, Noise tolerance : ≤0.3 μT
  • Dimensions and Weight: EOS column: 750 × 1000 × 1470 mm, 405 kg

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JIB-4700F

  • Category: Electron Microscopy
  • Technique: Scanning Electron Microscopy
  • Manufacturer: JEOL
  • Country: Japan
  • Available: Active
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