Specifications

  • Category: Electron Microscopy
  • Technique: Scanning Electron Microscopy
  • Manufacturer: ZEISS Microscopy
  • Country: Germany
  • Available: Active
All specifications

About

Short description

Large chamber SEM supporting 300 mm diameter samples and 210 mm height. Designed for heavy and large specimens in industrial, forensic, and geological applications.

Specifications

Large chamber SEM supporting 300 mm diameter samples and 210 mm height. Designed for heavy and large specimens in industrial, forensic, and geological applications.

  • Status: Active
  • Country: Germany
  • Electron gun type : Extreme FEG
  • Electron gun type : W Thermionic source
  • Electron gun type : LaB₆ Thermionic source
  • Standard detectors : ETSE detector
  • Optional detectors : HD BSD, VPSE, EPSE, EDS, WDS, EBSD, CL, STEM
  • Cryo : Optional
  • STEM : Optional
  • STEM parameters: STEM detector for thin section imaging
  • Additional analytical capabilities (EDS/EDX ; EELS; SAED;NBD; others) : EDS, WDS, EBSD, CL, STEM, Raman
  • Electron optics : Tungsten, LaB₆, or HD Schottky FE electron sources
  • Resolution : 1.9–20 nm at30 kV depending on source and mode
  • Electron beam resolution : 1.9–20 nm
  • Beam current : 0.5 pA to 5 µA
  • Accelerating voltage : 0.2–30 kV
  • Image parameters : SE, BSE, MIX, Shadow, TOPO, 3D
  • Magnification : <5–1,000,000×
  • Chamber : Ø420×330 mm
  • Camera details : CCD for Raman spectroscopy (optional)
  • Stage parameters : X: 130 mm, Y: 130 mm, Z: 60 mm (50 mm motorized), T: –10° to 90°, R: 360° (continuous)
  • Holder Types : Standard and optional specialty holders
  • Sample size: Max height 210 mm
  • Cooling system : No water cooling required
  • Vacuum system : Variable pressure 10–400 Pa (MA), 10–3000 Pa (LS)
  • Power Requirements and Consumption : 100–240 V, 50/60 Hz, single phase

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Sigma​ 500

  • Category: Electron Microscopy
  • Technique: Scanning Electron Microscopy
  • Manufacturer: ZEISS Microscopy
  • Country: Germany
  • Available: Active
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