Specifications

  • Category: Electron Microscopy
  • Technique: Scanning Electron Microscopy
  • Manufacturer: TESCAN
  • Country: Czechia
  • Available: Active
All specifications

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Short description

Fully automated Ga FIB-SEM for routine TEM prep, nanoscale prototyping, and 3D materials analysis with BrightBeam SEM and Orage FIB

Specifications

Fully automated Ga FIB-SEM for routine TEM prep, nanoscale prototyping, and 3D materials analysis with BrightBeam SEM and Orage FIB

  • Status: Active
  • Country: Czechia
  • Electron gun type : Schottky FEG
  • FIB: Yes
  • STEM : Yes
  • STEM parameters: STEM image overlay, grain orientation, nanomanipulator-supported sample orientation
  • Additional analytical capabilities (EDS/EDX ; EELS; SAED;NBD; others) : EDS, STEM, 3D ToF-SIMS tomography, FEBID/FIBID, prototyping
  • Electron optics : BrightBeam Field-Free UHR SEM column with Orage Ga FIB column
  • Resolution : -
  • Optical column : Field-free analytical SEM optics; precise beam placement with Orage FIB column
  • Beam current : Up to 100 nA with Orage FIB column
  • Image parameters : STEM overlay with grain orientation mapping, high-quality imaging during prep
  • Chamber : Integrated FIB-SEM with multi-specimen prep and TEM AutoPrep Pro
  • Stage parameters : Automated multi-site TEM sample prep using TEM AutoPrep Pro
  • Holder Types : TEM lift-out, inverted/planar orientation sample support
  • Sample size: Multi-site TEM lamella; FIB cut of ~50 µm particle shown
  • Vacuum system : High vacuum system integrated with SEM and FIB

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TENSOR

  • Category: Electron Microscopy
  • Technique: Transmission Electron Microscopy
  • Manufacturer: TESCAN
  • Country: Czechia
  • Available: Active
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