MultiSEM 506

Operates 91 electron beams in parallel for high-throughput nanometer-resolution imaging. Enables automated, unsupervised acquisition workflows. Offers >1 TB/hour imaging speed for volumes >1 mm³

• Status: Active
• Country: Germany
• Electron gun type : Schottky FEG
• Standard detectors : Secondary electron projection optics with high-efficiency multi detection unit
• Additional analytical capabilities (EDS/EDX ; EELS; SAED;NBD; others) : Compatible with Shuttle & Find correlative imaging, ATUMtome, ZEN API, section detection, image stitching, intelligent retake manager
• Electron optics : 91-beam parallel system with hexagonal beam pattern and finely tuned secondary electron detection path
• Resolution : ≤ 3.5 nm at 1.0, 1.5, 3.0 kV (average across all beams)
• Electron beam resolution : ≤ 3.5 nm (average); uniformity ≤ ±1 nm
• Beam current : Single beam ≥ 570 pA; total current ≥ 52 nA; uniformity ≤ ±10%
• Accelerating voltage : 1.0 – 3.0 kV
• Image parameters : Step and scan; pixel size range 2–20 nm (12 µm pitch) or 2.5–20 nm (15 µm pitch); image composed of 91 sub-images in hexagonal pattern
• Chamber : Vacuum pressure ≤ 1 × 10⁻⁵ mbar; standard sample size ≤ 100 × 100 mm²; max height ≤ 30 mm
• Stage parameters : Stepper stage, X/Y/Z travel: 100/100/30 mm; XY repeatability ≤ ±3 µm; settling time ≤ 1.5 s
• Holder Types : Flat surface holder; Multi-purpose holder for EM stubs, wafer chips, TEM grids, ITO cover slips
• Sample size: Max 100 × 100 mm²; height ≤ 30 mm; flatness ≤ 500 nm/100 µm; weight ≤ 0.2 kg
• Vacuum system : Turbo molecular pump (≥260 l/s), oil-free scroll pump
• Vibration, Magnetic, Noise tolerance : Optional vibration isolation platform available
• Dimensions and Weight: Microscope: 1250×1200×2600 mm, 1600 kg; PSU rack: 800×800×2100 mm, 300 kg; IA rack: 800×800×2100 mm, 332 kg