SEM4000Pro

Analytical FE-SEM with Schottky source, three-stage lens, high beam current, and low vacuum mode

• Status: Active
• Country: China
• Electron gun type : Schottky FEG
• Standard detectors : ETD, Low Vacuum Detector (LVD), BSED
• Optional detectors : STEM, EDS, EBSD, Loadlock, Trackball/Knob panel
• STEM : Optional
• Additional analytical capabilities (EDS/EDX ; EELS; SAED;NBD; others) : EDS, EBSD, WDS
• Electron optics : Three-stage electromagnetic lens, magnetic field–free objective lens
• Resolution : 0.9 nm @ 30 kV (SE), 1.5 nm @ 30 kV (SE, 30 Pa), 2.5 nm @ 30 kV (BSE, 30 Pa)
• Optical column : Three-stage electromagnetic lens
• Electron beam resolution : 0.9–2.5 nm depending on mode
• Beam current : Up to 200 nA (optional)
• Accelerating voltage : 0.2–30 kV
• Image parameters : Auto focus, brightness/contrast, stitching, stigmator
• Magnification : 1× – 1,000,000×
• Chamber : Loadlock (optional), 110×110×65 mm stage range
• Camera details : Dual: Optical navigation + chamber monitoring
• Stage parameters : 5-axis: X/Y=110 mm, Z=65 mm, T=–10° to +70°, R=360°
• Vacuum system : Fully automated; low-vacuum to 180 Pa
• Power Requirements and Consumption : AC 220 V ±10%, 50 Hz, 2 kVA
• Environmental requirements : Temp 20–25°C; humidity ≤50%
• Dimensions and Weight: ≥3000×4000×2300 mm (installation)