Specifications

  • Category: Electron Microscopy
  • Technique: Scanning Electron Microscopy
  • Manufacturer: Raith
  • Country: Germany
  • Available: Active
All specifications

About

Short description

Multi-ion-species FIB-SEM nanofabrication system with laser interferometer stage. Supports unattended, ultra-precise large-area patterning and in-situ SEM metrology

Specifications

Multi-ion-species FIB-SEM nanofabrication system with laser interferometer stage. Supports unattended, ultra-precise large-area patterning and in-situ SEM metrology

  • Status: Active
  • Country: Germany
  • Standard detectors : FE-SEM column; in-situ process monitoring via SEM and EDX
  • Optional detectors : SEM, EDX, EBIC, EBAC, Resistive Contrast Imaging, GIS, nanomanipulators
  • FIB: Yes
  • STEM : Yes
  • STEM parameters: High-resolution 3D ion-STEM imaging, lithium ion contrast imaging
  • Additional analytical capabilities (EDS/EDX ; EELS; SAED;NBD; others) : Multi-species FIB, GIS, EDX, EBIC/EBAC, CAD navigation, large-area write-field stitching, 3D ion microscopy
  • Electron optics : Vertically mounted nanoFIB column, low-kV FE-SEM column for in-situ SEM, 4" laser interferometer stage
  • Resolution : Sub-10 nm FIB resolution
  • Optical column : nanoFIB ion column with Wien filter; field-free SEM column
  • Accelerating voltage : - (multi-ion FIB with dynamic control)
  • Image parameters : In-situ SEM metrology, live process monitoring, automated large-area FIB imaging with CAD overlay
  • Magnification : Sub-nm to cm patterning scale; - in × units
  • Chamber : 100 mm × 100 mm sample area, laser-corrected sample height adjustment
  • Camera details : SEM imaging; large-area mosaic imaging with light ions
  • Stage parameters : 4" laser interferometer-controlled stage; sub-nm precision; automatic correction for sample tilt/bow
  • Holder Types : Multiple universal holders and nanomanipulators
  • Sample size: 4" (100 mm × 100 mm) sample area
  • Aberration Correction type : Dynamic beam corrections, distortion-free write-field calibration
  • Cooling system : Environmental enclosure for lab adaptation
  • Vacuum system : High vacuum with gas injection and laser focus correction
  • Environmental requirements : Environmental enclosure adaptable to any lab setting
  • Vibration, Magnetic, Noise tolerance : Laser interferometer-controlled stage for high stability

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  • Category: Electron Microscopy
  • Technique: Scanning Electron Microscopy
  • Manufacturer: Raith
  • Country: Germany
  • Available: Active
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