Specifications

  • Category: Electron Microscopy
  • Technique: Scanning Electron Microscopy
  • Manufacturer: ZEISS Microscopy
  • Country: Germany
  • Available: Active
All specifications

About

Short description

Mid-size chamber SEM for analytical imaging. Suited for routine, forensic, and manufacturing tasks with SmartPI support.

Specifications

Mid-size chamber SEM for analytical imaging. Suited for routine, forensic, and manufacturing tasks with SmartPI support.

  • Status: Active
  • Country: Germany
  • Electron gun type : Extreme FEG
  • Electron gun type : W Thermionic source
  • Electron gun type : LaB₆ Thermionic source
  • Standard detectors : ETSE detector
  • Optional detectors : HD BSD, VPSE, EPSE, EDS, WDS, EBSD, CL, STEM
  • Cryo : Optional
  • STEM : Optional
  • STEM parameters: STEM detector for thin section imaging
  • Additional analytical capabilities (EDS/EDX ; EELS; SAED;NBD; others) : EDS, WDS, EBSD, CL, STEM, Raman
  • Electron optics : Tungsten, LaB₆, or HD Schottky FE electron sources
  • Resolution : 1.9–20 nm at30 kV depending on source and mode
  • Electron beam resolution : 1.9–20 nm
  • Beam current : 0.5 pA to 5 µA
  • Accelerating voltage : 0.2–30 kV
  • Image parameters : SE, BSE, MIX, Shadow, TOPO, 3D
  • Magnification : <5–1,000,000×
  • Chamber : Ø365×275 mm
  • Camera details : CCD for Raman spectroscopy (optional)
  • Stage parameters : X: 125 mm, Y: 125 mm, Z: 60 mm (50 mm motorized), T: –10° to 90°, R: 360° (continuous)
  • Holder Types : Standard and optional specialty holders
  • Sample size: Max height 145 mm
  • Cooling system : No water cooling required
  • Vacuum system : Variable pressure 10–400 Pa (MA), 10–3000 Pa (LS)
  • Power Requirements and Consumption : 100–240 V, 50/60 Hz, single phase

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Crossbeam 550

  • Category: Electron Microscopy
  • Technique: Scanning Electron Microscopy
  • Manufacturer: ZEISS Microscopy
  • Country: Germany
  • Available: Active
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