QuiiN

Quantum Ion Implanter at Nanoscale. Dual-beam system for ion implantation and SEM imaging. Enables isotope selection and in-situ annealing.

• Status: Active
• Country: France
• Electron gun type : Schottky FEG
• Standard detectors : Secondary Electron Detector (SED), Secondary Ion Detector (SID)
• Optional detectors : EDS (3rd party)
• FIB: Yes
• Additional analytical capabilities (EDS/EDX ; EELS; SAED;NBD; others) : EDS (3rd party)
• Electron optics : Electrostatic SEM column
• Resolution : Electron beam: 4 nm @ 25 keV; Ion beam: 5 nm (Veloce), 40 nm (iVeloce) @ 30 keV
• Optical column : E-CLIPSE SEM column; Veloce/iVeloce FIB columns
• Electron beam resolution : 4 nm @ 25 keV
• Beam current : Electron: few pA to >100 nA; Ion: <1 pA–1 µA (iVeloce), <1 pA–50 nA (Veloce)
• Accelerating voltage : 500 eV–30 keV (electron); 3 keV–30 keV (ion)
• Image parameters : Max frame size: 8k x 8k; 8 or 16-bit dynamic range
• Chamber : Width: 340 mm, Depth: 315 mm, 20+ ports, IR cameras
• Camera details : IR chamber view camera, second IR camera
• Stage parameters : 5-axis stage; X/Y: 130 mm; Z: 96 mm; Tilt: ±90°; Rotation: 360°
• Holder Types : Max specimen: 180 mm dia., 8000 g; 1000 g for full XYZRT motion
• Sample size: Max size: 180 mm dia.; height: 92 mm; weight: 8000 g
• Cooling system : Closed loop cooling circuit (FurnaSEM stage)
• Vacuum system : High vacuum < 9×10⁻³ Pa; all oil-free pumps
• Power Requirements and Consumption : 230 V ±10% / 50 Hz or 120 V / 60 Hz (optional); 2300 VA
• Environmental requirements : 17–24 °C; <65% RH; vibration <10 μm/s; acoustic noise <60 dBC
• Vibration, Magnetic, Noise tolerance : <300 nT synchronous, <100 nT asynchronous; <10 μm/s vibration
• Dimensions and Weight: Room required: 4.2 × 3.1 m; door width 2.05 m