Specifications

  • Category: Electron Microscopy
  • Technique: Scanning Electron Microscopy
  • Manufacturer: ZEISS Microscopy
  • Country: Germany
  • Available: Active
All specifications

About

Short description

High-resolution SEM with Nano-twin lens and enhanced in-lens detection. Designed for low voltage imaging and damage-sensitive samples

Specifications

High-resolution SEM with Nano-twin lens and enhanced in-lens detection. Designed for low voltage imaging and damage-sensitive samples

  • Status: Active
  • Country: Germany
  • Electron gun type : Schottky FEG
  • Standard detectors : Inlens SE detector, Everhart Thornley SE detector, VPSE (with VP option)
  • Optional detectors : AsB4, aSTEM, SE2, CL, EDS, EBSD, WDS, BSD, 3DSM
  • Cryo : Optional
  • STEM : Optional
  • STEM parameters: aSTEM with 7-segment transmission detection, parallel contrast mechanisms
  • Additional analytical capabilities (EDS/EDX ; EELS; SAED;NBD; others) : EDS, EBSD, CL, STEM, WDS, 3DSM, Atlas 5 mapping, 3View, Shuttle & Find correlative microscopy
  • Electron optics : Gemini column with Nano-twin lens; enhanced beam booster and detection system
  • Resolution : 0.6 nm at15 kV, 1.1 nm at1 kV, 1.2 nm at0.5 kV
  • Optical column : Gemini column with Nano-twin lens and electrostatic-magnetic design
  • Electron beam resolution : 0.6–1.2 nm depending on voltage
  • Beam current : 3 pA to 20 nA (up to 100 nA configuration)
  • Accelerating voltage : 0.02–30 kV
  • Image parameters : High-resolution SE/BSE, enhanced low-kV imaging, annular STEM, EsB contrast
  • Magnification : 20× to 2,000,000×
  • Camera details : Frame Store up to 32k × 24k pixels
  • Stage parameters : 5-axis motorized eucentric stage: X/Y = 130 mm, Z = 50 mm, T = –3° to +70°, R = 360°
  • Holder Types : Compatible with AFM, tensile, cryo, heating stages
  • Aberration Correction type : Nano-twin lens minimizes chromatic aberration; not a full Cs-corrector
  • Vacuum system : NanoVP up to 500 Pa; true in-lens detection at 150 Pa; local charge compensation
  • Vibration, Magnetic, Noise tolerance : Beam booster minimizes stray field sensitivity

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MultiSEM 506

  • Category: Electron Microscopy
  • Technique: Scanning Electron Microscopy
  • Manufacturer: ZEISS Microscopy
  • Country: Germany
  • Available: Active
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