Specifications

  • Category: Electron Microscopy
  • Technique: Scanning Electron Microscopy
  • Manufacturer: Hitachi High-Tech
  • Country: Japan
  • Available: Active
All specifications

About

Short description

Ultra-High-Resolution Schottky SEM. Supports simultaneous multi-signal imaging. Designed for variable pressure and large specimens.

Specifications

Ultra-High-Resolution Schottky SEM. Supports simultaneous multi-signal imaging. Designed for variable pressure and large specimens.

  • Status: Active
  • Country: Japan
  • Electron gun type : Schottky FEG
  • Standard detectors : UD, MD, LD, PD-BSED
  • Optional detectors : UVD, EDS, WDS, EBSD, CL, STEM
  • Cryo : Optional
  • STEM : Optional
  • STEM parameters: STEM detector (optional)
  • Additional analytical capabilities (EDS/EDX ; EELS; SAED;NBD; others) : EDS, WDS, EBSD, CL, cryo, STEM
  • Electron optics : Newly designed electron optics and detection system
  • Resolution : 0.8 nm at15 kV, 0.9 nm at1 kV
  • Electron beam resolution : 0.8–0.9 nm
  • Beam current : Max. 200 nA
  • Accelerating voltage : 0.1–30 kV (0.01 kV step)
  • Image parameters : Multi-signal simultaneous imaging, topographic, structural, crystallographic
  • Magnification : 20–2,000,000×
  • Chamber : Max Ø200 mm, 80 mm height, 18 accessory ports
  • Camera details : Camera navigation system (optional)
  • Stage parameters : X: 0–135 mm, Y: 0–100 mm, Z: 1.5–40 mm, Tilt: –5° to +70°, Rotation: 360°
  • Holder Types : Compatible with various sub-stages
  • Sample size: Max Ø200 mm, 80 mm height
  • Cooling system : Recirculating cooling water (optional)
  • Vacuum system : Dry pump, VP: 5–300 Pa
  • Dimensions and Weight: 890×1200×1650 mm, 950 kg (main unit)

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  • Category: Optical Emission Spectroscopy
  • Technique: Spark-OES/GD-OES
  • Manufacturer: Hitachi High-Tech
  • Country: Japan
  • Available: Active
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