IMS Wf

High-precision magnetic SIMS for ultra-shallow depth profiling, 300mm wafer mapping.

• Status: Active
• Country: France
• Isotopic: Yes
• Elemental: Yes
• Type of measurable elements: Most of elements, isotopes, and molecular species
• Measurable isotopes/elements: B, P, As, Sb, O, N, H, Si, Ge, Mg, In, Al, etc.
• Analyzer type : Magnetic Sector MS
• Ion source type: Dual: Cs⁺ (60°) and RF-plasma O₂⁺ (36°) columns
• Inlet types: Direct wafer loading, robot transfer
• Mass range : 1–2000 m/z
• High Resolution : Yes
• Mass resolution/ Mass resolving power : Up to 10,000 (MRP), typically 6000 at FWHM
• Collectors qty : 1 (Faraday + Electron Multiplier)
• Sensitivity : Sub-ppm; high for light elements and dopants
• Dynamic range : >6 orders of magnitude
• Detection limits : ~10–100 ppt for key elements
• Precision : Sub-percent precision; <0.3% dose variation in wafer mapping
• Detector type : Dual detection: Faraday cup and Electron Multiplier
• Primary beam : 100 eV to 13 keV (Cs⁺), 100 eV to 10 keV (O₂⁺)
• Spatial resolution : Sub-micron profiling with precise positioning
• Geometry type : Double-focusing magnetic sector geometry
• Vacuum system : 2 turbo pumps + 1 forepump; analytical chamber at 10⁻¹⁰ mbar
• Dimensions and Weight: 1450 × 780 × 1550 mm